Thermofisher Scientific Nanolab 600 Dual Beam FIB
Electron optics
High-resolution FEG-SEM column, monopole magnetic immersion final lens, Schottky thermal field emitter, 60-degree objective lens geometry, and heated objective apertures.
Voltage Range: 0.2 to 30.0 kV
Current Range: 10 pA to 20 nA
Resolution at optimum working distance (5.4 mm):
- 1 nm @ 15 kV (TLD-SE)
- 5 nm @ 1 kV (TLD-SE)
- 5 nm @ 500 V (TLD-SE)
- 5 nm @ 500 V (TLD-BSE)
Resolution at beam coincidence point:
- 0 nm @ 30 kV (STEM)
- 5 nm @ 15 kV (TLD-SE)
- 0 nm @ 5 kV (TLD-SE)
Ion optics
Magnum TM ion column with Ga liquid metal ion source with 7 nm resolution (5 achievable). Maximum horizontal field width of 2.5 mm at 5 kV and the beams coincidence point.
Voltage Range: 5 to 30 kV
Current Range: 1 pA to 20 nA
Detectors
- Through lens secondary electron detector (TLD-SE)
- Through lens secondary backscattered electron detector (TLD-BSE)
- Everhardt-Thornley secondary electron detector (ETD-SE)
- IR-CCD camera
Gas chemistry
- Zero collision gas injection system (GIS)
- 5 ìm placing accuracy without user interaction
- GIS control available for automation
- Reconfigurable individual gas injectors (up to 5 gas injectors)
- Gas chemistry options:
- Platinum metal deposition
- Tungsten metal deposition
Fabrication and machining
- Minimum deposited line width:
- Ion beam, Pt: 50 nm achievable
- Electron beam, Pt: 20 nm achievable
- Minimum etched line width (Si): <15 nm achievable
- Maximum hole aspect ratio (Si, 500 nm hole radius): 10:1
- Maximum hole aspect ratio (Si, 500 nm hole radius, XeF2, coaxial needle): 10:1
- Typical TEM sample membrane thickness: 50-100 nm (30-50 achievable)
Sample manipulation
Omniprobe Autoprobe 200 nanomanipulator lift-out tool
EDAX/TSL System with Hikari EBSD Detector
- Full featured, integrated CCD-based detector for electron backscattered diffraction applications (EBSD)
- Simultaneous acquisition and indexing speeds of up to 450 patterns per second for many materials